Identifiant pérenne de la notice : 219082170
Notice de type
Notice de regroupement
Note publique d'information : To anyone who is interested in surface chemical analysis of materials on the nanometer
scale, this book is prepared to give appropriate information. Based on typical application
examples in materials science, a concise approach to all aspects of quantitative analysis
of surfaces and thin films with AES and XPS is provided. Starting from basic principles
which are step by step developed into practically useful equations, extensive guidance
is given to graduate students as well as to experienced researchers. Key chapters
are those on quantitative surface analysis and on quantitative depth profiling, including
recent developments in topics such as surface excitation parameter and backscattering
correction factor. Basic relations are derived for emission and excitation angle dependencies
in the analysis of bulk material and of fractional nano-layer structures, and for
both smooth and rough surfaces. It is shown how to optimize the analytical strategy,
signal-to-noise ratio, certainty and detection limit. Worked examples for quantification
of alloys and of layer structures in practical cases (e.g. contamination, evaporation,
segregation and oxidation) are used to critically review different approaches to quantification
with respect to average matrix correction factors and matrix relative sensitivity
factors. State-of-the-art issues in quantitative, destructive and non-destructive
depth profiling are discussed with emphasis on sputter depth profiling and on angle
resolved XPS and AES. Taking into account preferential sputtering and electron backscattering
corrections, an introduction to the mixing-roughness-information depth (MRI) model
and its extensions is presented.
paprika.idref.fr
data.idref.fr
Documentation
